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Figure 1 | Journal of NeuroEngineering and Rehabilitation

Figure 1

From: In vitro and in vivo evaluation of a photosensitive polyimide thin-film microelectrode array suitable for epiretinal stimulation

Figure 1

The manufacturing procedures of dual metal- layer microelectrode array. (a) Evaporation of aluminum sacrificial layer onto the silicon wafer and spin-coating of the first PSPI film; (b) Sputtering and patterning of the lower Ti/Pt layer; (c) Spin-coating and patterning of the middle PSPI layer to expose half of the stimulating electrodes and bonding pads; (d) Sputtering and patterning upper Ti/Pt layer; (e) Spin-coating and patterning of the upper PSPI layer to expose the whole stimulating electrodes and bonding pads; (f) Microelectrode array released from the silicon substrate.

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